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Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)

        

Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)

Logo for Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)
Atomic layer deposition (ALD) is an emerging nanotechnology, which is a surface controlled self-limiting process and enables us to deposit ultrathin films one atomic layer by one atomic layer. ALD provides an unprecedented and powerful capability to grow or regrow nanoscale ultrathin films of metals, semiconductors and insulators. We will introduce the concept of ALD and the process how to the tiniest and fastest transistor using ALD.
Material Type: Presentation
Technical Format: Flash
Date Added to MERLOT: February 17, 2006
Date Modified in MERLOT: February 17, 2006
Author:
Submitter: nanoHUB

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Primary Audience: College General Ed
Mobile Compatibility: Not specified at this time
Language: English
Cost Involved: no
Source Code Available: no
Accessiblity Information Available: no
Creative Commons: unsure

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