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Author:
Peide "Peter" Ye
Purdue University
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| Description: |
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Atomic layer deposition (ALD) is an emerging nanotechnology, which is a surface controlled self-limiting process and enables us to deposit ultrathin films one atomic layer by one atomic layer. ALD provides an unprecedented and powerful capability to grow or regrow nanoscale ultrathin films of metals, semiconductors and insulators. We will introduce the concept of ALD and the process how to the tiniest and fastest transistor using ALD.
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| More information about this material: |
Primary Audience:
College General Ed
Mobile Compatibility:
Not specified at this time
Language:
English
Cost Involved:
no
Source Code Available:
no
Accessiblity Information Available:
no
Copyright:
yes
Creative Commons:
unsure
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About this material: |
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