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Material Detail

Ion Implant

Ion Implant

This website includes an animation which illustrates the ion implant process. Objective: Name the three common dopants used in implantation processes and explain the process of generating an ion beam from source to wafer. You can find this animation under the heading "Process & Equipment III." This simulation is from Module 026 of the Process & Equipment III Cluster of the MATEC Module Library (MML). To view other clusters or for more information about the MML visit http://matec.org/ps/library3/process_I.shtmlKey
Keywords:
stem education, workforce development, technician training, advanced technological education
Disciplines:
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More about this material

Material Type:
Presentation
Date Added to MERLOT:
July 18, 2016
Date Modified in MERLOT:
July 18, 2016
Author:
Submitter:
Barbra Bied Sperling
Hispanic Serving Institution
Primary Audience:
Grade School, Middle School, High School, College General Ed, College Lower Division, College Upper Division, Graduate School, Professional
Technical Format:
Website, Flash
Mobile Compatibility:
Not specified at this time
Language:
English
Cost Involved:
No
Source Code Available:
No
Accessibility Information Available:
Unknown
Creative Commons:
No

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