Material Detail

Ion Implant

Ion Implant

This website includes an animation which illustrates the ion implant process. Objective: Name the three common dopants used in implantation processes and explain the process of generating an ion beam from source to wafer. You can find this animation under the heading "Process & Equipment III." This simulation is from Module 026 of the Process & Equipment III Cluster of the MATEC Module Library (MML). To view other clusters or for more information about the MML visit http://matec.org/ps/library3/process_I.shtmlKey

Quality

  • User Rating
  • Comments
  • Learning Exercises
  • Bookmark Collections
  • Course ePortfolios
  • Accessibility Info

More about this material

Comments

Log in to participate in the discussions or sign up if you are not already a MERLOT member.