Material Detail

"Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)" icon

Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)

Atomic layer deposition (ALD) is an emerging nanotechnology, which is a surface controlled self-limiting process and enables us to deposit ultrathin films one atomic layer by one atomic layer. ALD provides an unprecedented and powerful capability to grow or regrow nanoscale ultrathin films of metals, semiconductors and insulators. We will introduce the concept of ALD and the process how to the tiniest and fastest transistor using ALD.
Rate

Quality

  • User Rating
  • Comments
  • Learning Exercises
  • Bookmark Collections
  • Course ePortfolios
  • Accessibility Info

More about this material

Browse...

Disciplines with similar materials as Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)
Other materials like Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)

Comments

Log in to participate in the discussions or sign up if you are not already a MERLOT member.
hidden