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Plasma & RF Fundamentals

Plasma & RF Fundamentals

This is a description for a learning module from Maricopa Advanced Technology Education Center. This PDF describes the module; access may be purchased by visiting the MATEC website. One third of modern semiconductor process steps and a variety of other applications employ plasma technology. RF energy is commonly used to generate and maintain a plasma which accelerates chemical processes or provides other desired outcomes such as light emission. This module is the first in a series that builds a knowledge foundation for understanding plasma technology and RF energy. Concepts and principles covered include particle behavior under plasma conditions, changes in electromagnetic wave forms, and related variables that affect RF/plasma applications.
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